МОДЕЛИРОВАНИЕ ПРИБОРОВ
| 期 | 标题 | 文件 | |
| 卷 52, 编号 1 (2023) | Calculation of the Electric Field Strength and Current Density Inside a Thin Metal Layer, Taking into Account the Skin Effect |
 (Rus) |
|
| Zavitaev E., Rusakov O., Chukhleb E. | |||
| 1 - 1 的 1 信息 | |||
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关键字
Förster effect
bipolar transistor
charge qubit
dissociation
etching
fluorocarbon gases
gas temperature
ionization
kinetics
mechanism
memristor
modeling
molecular beam epitaxy
plasma
polymerization
quantum dot
radiation intensity
reduced electric field strength
resistive switching
silicon
specific power
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卷 53, 编号 6 (2024)
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关键字
Förster effect
bipolar transistor
charge qubit
dissociation
etching
fluorocarbon gases
gas temperature
ionization
kinetics
mechanism
memristor
modeling
molecular beam epitaxy
plasma
polymerization
quantum dot
radiation intensity
reduced electric field strength
resistive switching
silicon
specific power
最新一期